Keynote Speakers of ICMIM 2018

1st Keynote Speaker

 

Prof. Jun Ding

 

National University of Singapore, Singapore

 

Dr Jun DING obtained his Diplom Physics from University of Wuppertal in 1986, and PhD degree from Ruhr University Bochum, Germany in 1990. He has been working on magnetic and nanostructured materials for more than 25 years. He is currently working as Professor at Department of Materials Science & Engineering, National University of Singapore. He has published over 350 journal papers with a total citation > 9000 and H-Index = 52.

 

Research Interests

Additive Manufacturing (3D Printing): Recently, Prof Ding Jun’s research has been concentrated on additive manufacturing. His research has been focused on the development of starting mateirals for fabrication of multi-functioanal devices/structures of metal, ceramics, polymer and composite.

Nanomagnetics/spintronics and their applications: Prof Ding Jun has been working in the area of nanomagnetics and spintronics for many years. Recently, he has paid a particular attention on these materials and devices in different applications, including spintronic structures in information storage, nanoparticles in biomedical and environmental applications, magnetic sensors, magnetic energy harvesters and metamaterials. 3D printing will be used in the device fabrication.

 

 

2nd Keynote Speaker

Assoc. Prof. Pan Jisheng


Institute of Materials Research and Engineering/ National University of Singapore (NUS), Singapore



Dr. Jisheng Pan received his B. Sc in Physics from Zhejiang University in 1985 and his M. Sc in Nuclear Physics in 1988 from Shanghai Institute of applied Physics, Chinese Academy of Sciences, where he worked for 6 years in nuclear technology. He graduated in 1998 with his PhD in surface science from National University of Singapore. Currently, he is a senior scientist and photoemission spectroscopy (PES) group leader in Institute of Materials Research & Engineering, Agency for Science, Technology and Research (A*Star), Singapore. He is also an Adjunct Associate Professor in the Department of Physics, National University of Singapore. His areas of research interest are photoemission technique development, 2D materials for nanodevice application, surface nanostructure formation, characterization and application on catalysis, growth and characterization of thin films for microelectronic device fabrication, Ion beam pattern of semiconductor surfaces. Dr. Pan has authored or co-authored more than 250 refereed journal articles, one patent, two know-hows and given more than 80 presentations at international conferences. He has also provided surface analysis and consulting service to many local and international companies in Singapore. In the past 10 years his research team has studied many material system interfaces such as metal/semiconductor, semiconductor/semiconductor, high-k insulator/semiconductor using PES technique. In addition, His team developed various models for different interfaces to eliminate possible photoemission charge effect in affecting the data analysis to obtain accurate band alignment information. The knowledge in this area can significantly contribute to the understanding of the mechanisms governing the properties of semiconductor interface. Dr. Pan has received many awards including achievement award from A*Star Aerospace Programme, 2015; Assessor Award (Silver) from Singapore Accreditation Council, 2015; “Best of session” paper accreditation at Semicon West Exhibition (San Jose, USA) in 2002; the Natural Science Award of Chinese Academy of Sciences in 1991. He is a technical assessor of Singapore Accreditation Council (SAC); a technical committee member of ISO/TC 201 surface chemical analysis, Singapore; an associate editor of Surface and Interface Analysis; an editorial board member of Journal of Spectroscopy. He is also a member of many professional societies such as AVS (USA), MRS (Singapore), IPS (Singapore) and NSC (China).

 

Research Interests

  • 2D materials for nanodevice application

  • Surface nanostructure growth and characterization

  • Growth and characterization of thin film for microelectronic device fabrication

  • Low energy ion beam modification and patterning of semiconductor and polymer surfaces

  • Gas absorption on metal and semiconductor single crystals as well as on surfaces of catalyst

  • Industry surface analysis and consulting service



Hoping you can learn a lot from the keynote speakers' reports.